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With the continuous development of technology, infrared heating technology has gradually become the focus of people's attention. It is widely used in industries, semiconductors, healthcare, and other fields due to its advantages of high efficiency, environmental protection, and safety.

The principle and characteristics of infrared heating:

Infrared heating technology utilizes the characteristic of semiconductor materials absorbing infrared light and converting it into heat to achieve heating of target objects. The core principle is that when semiconductor materials absorb infrared light, electrons transition from the valence band to the conduction band, forming an electric current and generating heat. These heat causes the temperature of the target object to increase, thereby achieving a heating effect.

Infrared heating technology has the following characteristics:

● Efficiency: Due to the high energy of infrared light, semiconductor materials can efficiently convert it into heat, thereby achieving rapid heating.

● Environmental friendliness: Infrared heating technology does not produce harmful substances during use, and there is no noise pollution, making it an environmentally friendly heating method.

● Safety: Due to the fact that infrared heating is purely resistive heating, current will not pass through the semiconductor material itself, thus it has high safety.

● Wide applicability: Infrared heating equipment has a small volume, is easy to install, and is suitable for objects of various shapes and sizes.

The application of infrared heating technology

1. Wafer heating device

Silicon wafer is an important semiconductor material widely used in fields such as circuit manufacturing and solar panels. Heating is an important step in the preparation process of silicon wafers, which can remove organic matter and bubbles, activate materials, adjust shapes, enhance material structures, etc., ensuring the surface purity and quality of silicon wafers, and enabling them to play a better role in various application fields. By utilizing infrared (IR) radiation to generate dense heat, the temperature of the wafer can be accurately measured by an infrared pyrometer.

The following diagram is a type of RTP system. In the RTP system, the lights on the upper and lower sides are placed vertically to evenly heat the wafer with infrared radiation. The wafer temperature is monitored by a pyrometer and then controlled through power feedback from tungsten halogen lamps. The heated surface receives the average red line radiation energy, effectively reducing the adverse process quality problems caused by uneven temperature.

2. Vacuum reflow soldering furnace

A vacuum reflow furnace is a process of high-quality welding of products in a vacuum environment, which is used to protect the products and solder from oxidation under vacuum conditions. At the same time, it reacts with the oxide on the surface of the products and solder to improve the quality of the welding surface and reduce the porosity of the welding. Generally used in high-precision products such as aerospace, medical, and automotive. The vacuum chamber is equipped with a built-in heating system, which adopts the principle of infrared radiation heating. It has the characteristics of uniform temperature, ultra-low temperature safe welding, no temperature difference, no overheating, reliable and stable process parameters, no need for complex process tests, and low environmental cost operation. It meets the needs of multiple varieties, small batches, and high reliability welding of military products.

3. Vacuum electroplating furnace

A vacuum electroplating furnace is a device used for electroplating the surface of metals or other materials. It can electroplate in a vacuum environment, thereby improving the quality and durability of the electroplating layer. Controlling temperature is a crucial step in operating a vacuum electroplating furnace. Overall, temperature control of vacuum electroplating furnaces is very important. By utilizing the characteristics of infrared heating, precise temperature control and ensuring temperature uniformity can effectively improve the quality and durability of the electroplating layer, meeting the requirements of different electroplating processes. At the same time, it can also ensure the safety and stability of the electroplating process.